En2core Technology, Inc.

Gyueng Hyuen Choe

Jin Huh

Sae Hoon Uhm

Se Hong Park

Yeonghoon Sohn

Dong Jegal

According to one embodiment of the present disclosure, there can be provided a plasma processing system for multi-station, the system including a processing chamber including at least two or more stations, one plasma generator provided for each of the stations, one inverter provided for each of the plasma generators, a sensing unit configured to measure an electric characteristic of each of the plasma generators, and a controller configured to acquire sensing data from the sensing unit and control each of the inverters.

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Chungcheongbuk-do, South Korea

Gyueng Hyuen Choe