The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Dec. 28, 2022
Applicant:

En2core Technology, Inc., Daejeon, KR;

Inventors:

Sae Hoon Uhm, Hwaseong-si, KR;

Dong Jegal, Yongin-si, KR;

Yeonghoon Sohn, Daejeon, KR;

Gyueng Hyuen Choe, Chungcheongbuk-do, KR;

Se Hong Park, Daejeon, KR;

Jin Huh, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32165 (2013.01); H01J 37/3211 (2013.01); H01J 37/32467 (2013.01); H01J 37/32743 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/327 (2013.01);
Abstract

According to one embodiment of the present disclosure, there can be provided a plasma processing system for multi-station, the system including a processing chamber including at least two or more stations, one plasma generator provided for each of the stations, one inverter provided for each of the plasma generators, a sensing unit configured to measure an electric characteristic of each of the plasma generators, and a controller configured to acquire sensing data from the sensing unit and control each of the inverters.


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