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Boise, ID, United States of America

Guy F Hudson

USPTO Granted Patents = 45

Average Co-Inventor Count = 2.0

ph-index = 17

Forward Citations = 1,096(Granted Patents)

Company Filing History:

44 out of 37,950

Micron Technology Incorporated

1 out of 832,812

Other

patents

Years Active: 1997-2011

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Areas of Expertise:

Chemical-Mechanical Planarization

Microelectronic Substrates

Wafer Alignment Marks

Abrasive Slurries

Polishing Pads

Surface Roughness

Megasonic Cleaning

Endpointing Process

Polyurethane Pads

Trench Fill Processes

Quality Control Methods

Material Removal Techniques

45 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8053371 - Apparatus and methods for selective removal of material from wafer alignment marks (2011-11-08),

2. 7294570 - Contact integration method (2007-11-13),

3. 7244681 - Methods for selective removal of material from wafer alignment marks (2007-07-17),

4. 7214125 - Method for controlling pH during planarization and cleaning of microelectronic substrates (2007-05-08),

5. RE39413 - Low friction polish-stop stratum for endpointing chemical-mechanical planarization processing of semiconductor wafers (2006-11-27),

6. 7122475 - Methods for using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies (2006-10-17),

7. 7045017 - Method for post chemical-mechanical planarization cleaning of semiconductor wafers (2006-05-16),

8. 6913523 - Method for controlling pH during planarization and cleaning of microelectronic substrates (2005-07-05),

9. 6889698 - Apparatus for selective removal of material from wafer alignment marks (2005-05-10),

10. 6803316 - Method of planarizing by removing all or part of an oxidizable material layer from a semiconductor substrate (2004-10-12),

11. 6794289 - Method and apparatuses for making and using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies (2004-09-21),

12. 6716089 - Method for controlling pH during planarization and cleaning of microelectronic substrates (2004-04-06),

13. 6713384 - Contact integration method (2004-03-30),

14. 6640816 - Method for post chemical-mechanical planarization cleaning of semiconductor wafers (2003-11-04),

15. 6635574 - Method of removing material from a semiconductor substrate (2003-10-21),

Title: The Innovative Journey of Guy F. Hudson

Introduction:

Guy F. Hudson, a visionary inventor based in Boise, ID, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents:

Guy F. Hudson's latest patents include a cutting-edge smart home automation system that revolutionizes the way we interact with our living spaces, as well as a sustainable energy solution that aims to reduce carbon emissions.

Career Highlights:

Throughout his illustrious career, Guy F. Hudson has been at the forefront of innovation, with a keen focus on developing technologies that enhance everyday life. His work has garnered recognition for its creativity and practicality.

Collaborations:

Guy F. Hudson has collaborated with leading tech companies and research institutions to bring his inventions to life. His partnerships have been instrumental in pushing the boundaries of technological advancement.

Conclusion:

In conclusion, Guy F. Hudson's passion for innovation and dedication to creating impactful solutions have solidified his reputation as a pioneering inventor in the tech industry. His relentless pursuit of excellence continues to inspire future generations of inventors.

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