Plaistow, NH, United States of America

Guray Tas

This inventor holds 1 USPTO granted patent. Top assignee: Onto Innovation Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Guray Tas. Retrieved from https://idiyas.com/inventor/guray-tas-c6afx8ic

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Guray Tas in Substrate Edge Patterning Techniques

Introduction

Guray Tas is an accomplished inventor based in Plaistow, NH (US). He has made significant contributions to the field of substrate edge patterning techniques. His innovative work focuses on improving the efficiency of imaging edge regions of substrate panels.

Latest Patents

Guray Tas holds 1 patent for his invention titled "Substrate edge patterning techniques." This patent describes various techniques to quickly image one or more edge regions of a substrate panel without affecting other regions. The invention includes the use of an illumination mask assembly coupled to a clamp assembly, allowing for precise imaging of edge regions, including dummy patterns, before immersion into a plating bath.

Career Highlights

Guray Tas is currently associated with Onto Innovation Inc., where he continues to develop and refine his innovative techniques. His work has been instrumental in advancing the technology related to substrate processing.

Collaborations

Guray has collaborated with notable coworkers, including Keith F Best and Mark Howard, contributing to a dynamic and innovative work environment.

Conclusion

Guray Tas's contributions to substrate edge patterning techniques exemplify the spirit of innovation in technology. His work not only enhances efficiency but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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