Company Filing History:
Years Active: 2005-2012
Title: Guohong Zhang: Innovator in Photolithography
Introduction
Guohong Zhang is a prominent inventor based in Plano, TX, known for his contributions to the field of photolithography. With a total of 7 patents to his name, Zhang has made significant advancements that enhance the efficiency and effectiveness of photolithographic processes.
Latest Patents
One of Zhang's latest patents focuses on merging sub-resolution assist features of a photolithographic mask. This innovative process involves receiving a mask pattern that includes sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A merge bar width of a merge bar is established, and a distance between the first and second sub-resolution assist features is determined. A merging technique is then identified based on the distance and the merge bar width. Finally, the first and second sub-resolution assist features are merged according to the identified merging technique.
Career Highlights
Guohong Zhang is currently employed at Texas Instruments Corporation, where he continues to develop cutting-edge technologies in photolithography. His work has been instrumental in advancing the capabilities of photolithographic masks, which are crucial in semiconductor manufacturing.
Collaborations
Zhang has collaborated with notable colleagues, including Sean Christopher O'Brien and Stephen J DeMoor. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Guohong Zhang's contributions to the field of photolithography through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor technology.