The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2008

Filed:

Jul. 20, 2004
Applicants:

Theodore W. Houston, Richardson, TX (US);

Robert Alan Soper, Plano, TX (US);

Guohong Zhang, Plano, TX (US);

Kayvan Sadra, Addison, TX (US);

Inventors:

Theodore W. Houston, Richardson, TX (US);

Robert Alan Soper, Plano, TX (US);

Guohong Zhang, Plano, TX (US);

Kayvan Sadra, Addison, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

According to one embodiment, a method for patterning a set of features for a semiconductor device includes providing a mask including a substrate and at least one pair of first and second main features disposed on a substrate. The method also includes positioning the mask over a layer of light-sensitive material, and exposing the mask to a light source. The mask also includes at least one sub-resolution feature connecting the first and second main features.


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