This inventor holds 9 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1981-1990.
Location History:
- Sindelfingen-Maichingen, DE (1985 - 1987)
- Sindelfingen, DE (1981 - 1990)
Company Filing History:
Years Active: 1981-1990
Title: Gunter Makosch: Innovator in Optical Alignment Technologies
Introduction
Gunter Makosch is a prominent inventor based in Sindelfingen, Germany. He has made significant contributions to the field of optical alignment technologies, holding a total of 9 patents. His work primarily focuses on enhancing the precision of lithographic devices and interferometric measuring methods.
Latest Patents
One of Gunter Makosch's latest patents is related to a phase-sensitive interferometric mask-wafer alignment method. This innovative alignment technique utilizes two light beams that symmetrically impinge on gratings associated with each alignment direction on the mask and wafer. The diffracted beams return along the optical axis of the alignment system, allowing for precise measurements of the relative phase using a phase compensation technique with an electro-optic modulator. The alignment process consists of two steps: a normalizing step and a measuring step, which together yield a position control signal for accurate alignment.
Another notable patent involves interferometric measuring methods for surfaces. In this method, a surface is illuminated with two beams that are polarized perpendicularly to each other. The scattered light is separated from the directly reflected light, and the phase difference is tested using electro-optical compensation. This phase difference is crucial for determining the distance of scattering elements from the optical axis, ensuring high accuracy in surface testing.
Career Highlights
Gunter Makosch is currently employed at International Business Machines Corporation (IBM), where he continues to develop innovative technologies in optical alignment. His expertise in this field has led to advancements that are essential for the precision required in modern lithography and surface measurement.
Collaborations
Throughout his career, Gunter has collaborated with notable colleagues, including Franz J Schedewie and Walter Jarisch. These partnerships have contributed to the development of cutting-edge technologies and have enhanced the impact of his inventions.
Conclusion
Gunter Makosch's contributions to optical alignment technologies have established him as a key figure in the field. His innovative patents and collaborations reflect his commitment to advancing precision in lithographic and measurement techniques.