The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 1985
Filed:
May. 03, 1982
Gunter Makosch, Sindelfingen-Maichingen, DE;
Franz Schedewie, Boblingen, DE;
International Business Machines Corporation, Armonk, NY (US);
Abstract
For the point-by-point interferometric measuring of surfaces which are scanned along lines, or which are subjected to a processing procedure (e.g. etching) a focused laser beam is directed with oblique incidence as a measuring beam onto the respective measured points. The respective height of a measured point determines the path difference (phase difference) between the measuring beam and a reference beam which has been suitably split off the input beam. The oblique incidence (angle of incidence .gtorsim.80.degree.) makes it possible to measure interferometrically very rough surfaces. The measuring range may be extended if the reference beam is directed at an oblique angle of incidence, differing only slightly from that of the measuring beam onto the surface to be examined.