Guido C Van De Looy

Title: Innovations of Guido C Van De Looy

Introduction

Guido C Van De Looy is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of optical imaging systems. With a total of 2 patents, his work focuses on enhancing the accuracy and functionality of optical devices.

Latest Patents

One of his latest patents is a "Device for detecting a magnification error in an optical imaging system." This device is designed to detect magnification errors in optical systems that utilize a telecentric lens system. It employs two gratings arranged in the object plane, which are imaged onto two gratings in the image plane. The system uses radiation-sensitive detection systems to supply periodic signals, allowing for precise measurement of magnification and focusing errors.

Another significant patent is for an "Opto-lithographic device comprising a displaceable lens system." This invention features a lens system positioned between a mask support and a substrate table. It allows for simultaneous and relative displacement of the lens system and mask support, enabling simple corrections for focusing and enlargement adjustments due to environmental variations.

Career Highlights

Guido C Van De Looy is associated with U.S. Philips Corporation, where he has contributed to various innovative projects. His expertise in optical systems has positioned him as a key figure in advancing technology in this field.

Collaborations

He has collaborated with notable coworkers such as Adrianus Gerardus Bouwer and Gijsbertus Bouwhuis, further enhancing the impact of his inventions.

Conclusion

Guido C Van De Looy's contributions to optical imaging systems demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to improving the accuracy and efficiency of optical devices.