The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 1988
Filed:
Oct. 14, 1986
Adrianus G Bouwer, Eindhoven, NL;
Guido C Van De Looy, Eindhoven, NL;
U.S. Philips Corporation, New York, NY (US);
Abstract
An opto-lithographic device comprising a lens system (13) arranged between a mask support (25) and a substrate table (33) and telecentric on one side, the lens system (13) and the mask support (25) being secured to a first holder (21) and a second holder (23), respectively, which can be displaced both simultaneously and relatively by means of a first actuator (183, 187, 189) and a second actuator (197, 199) for adjustment of focusing and enlargement. The invention provides the possibility of a simple correction of focusing and enlargement when this focusing and this enlargement are varied inter alia due to pressure or temperature variations.