Topsfield, MA, United States of America

Gregory R Gibilaro

This inventor holds 3 USPTO granted patents. Top assignee: Varian Semiconductor Equipment Associates, Inc.. Active years: 2008-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gregory R Gibilaro. Retrieved from https://idiyas.com/inventor/gregory-r-gibilaro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.2

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2008-2017

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3 patents (USPTO):Explore Patents

Title: Gregory R. Gibilaro: Innovator in Ion Implantation Technology

Introduction

Gregory R. Gibilaro is a notable inventor based in Topsfield, MA (US), recognized for his contributions to the field of ion implantation technology. With a total of 3 patents, he has made significant advancements that enhance the precision and efficiency of ion implantation processes.

Latest Patents

Gibilaro's latest patents include innovative methods and apparatuses designed to improve the control of implant processes. One of his key inventions is an "Apparatus and method for controlling implant process," which features a beam scanner that applies various waveforms during a non-uniform scanning mode. This apparatus includes a current detector that measures the ion beam's integrated current and a scan adjustment component that optimizes the beam width and current ratios. Another significant patent is the "Ion implanter optimizer scan waveform retention and recovery," which provides methods for controlling dose uniformity in ion implantation systems. This invention allows for the adjustment and storage of scan waveforms to ensure uniformity across multiple implant processes.

Career Highlights

Gregory R. Gibilaro is currently employed at Varian Semiconductor Equipment Associates, Inc., where he continues to develop cutting-edge technologies in semiconductor manufacturing. His work has been instrumental in advancing the capabilities of ion implantation systems, making them more efficient and reliable.

Collaborations

Gibilaro has collaborated with several talented individuals in his field, including Antonella Cucchetti and Joseph C. Olson. These collaborations have fostered innovation and contributed to the successful development of new technologies.

Conclusion

Gregory R. Gibilaro's contributions to ion implantation technology exemplify the impact of innovative thinking in the semiconductor industry. His patents reflect a commitment to enhancing process control and uniformity, solidifying his reputation as a leading inventor in this specialized field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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