Aurora, IL, United States of America

Gregory H Bogush


Average Co-Inventor Count = 5.6

ph-index = 2

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2003-2010

where 'Filed Patents' based on already Granted Patents

3 patents (USPTO):

Title: Gregory H. Bogush: Innovator in Chemical-Mechanical Polishing

Introduction

Gregory H. Bogush is a notable inventor based in Aurora, IL (US). He has made significant contributions to the field of chemical-mechanical polishing, holding a total of 3 patents. His work has advanced the methods and compositions used in the polishing of substrates, particularly those with dielectric layers.

Latest Patents

One of his latest patents is titled "Compositions and methods for dielectric CMP." This invention focuses on a chemical-mechanical polishing composition that includes an abrasive made of aggregated silica, an acid, and a liquid carrier. The composition is designed to have a pH of about 5 or less, enhancing the polishing process for substrates with dielectric layers. Another significant patent is the "Preequilibrium polishing method and system." This invention outlines a polishing system that incorporates a liquid carrier, alkali metal ions, hydroxide ions, and a polishing pad or abrasive. The system is designed to operate effectively with a pH of about 9 or more, utilizing suitable polar solvents like water.

Career Highlights

Gregory H. Bogush is currently employed at Cabot Microelectronics Corporation, where he continues to innovate in the field of polishing technologies. His expertise and inventions have contributed to the advancement of chemical-mechanical polishing processes, making them more efficient and effective.

Collaborations

Throughout his career, Gregory has collaborated with notable colleagues, including Jeffrey P. Chamberlain and Brian L. Mueller. These collaborations have fostered a productive environment for innovation and development in their field.

Conclusion

Gregory H. Bogush is a distinguished inventor whose work in chemical-mechanical polishing has led to significant advancements in the industry. His patents reflect a commitment to improving polishing methods and compositions, showcasing his expertise and innovative spirit.

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