The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7677956 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 16, 2010

Filed:

May. 10, 2002
Applicants:

Phillip Carter, Naperville, IL (US);

Gregory H Bogush, Aurora, IL (US);

Farhana Khan, Naperville, IL (US);

Timothy P Johns, Aurora, IL (US);

Robert Vacassy, Aurora, IL (US);

Inventors:

Phillip Carter, Naperville, IL (US);

Gregory H Bogush, Aurora, IL (US);

Farhana Khan, Naperville, IL (US);

Timothy P Johns, Aurora, IL (US);

Robert Vacassy, Aurora, IL (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01); B24B 7/19 (2006.01); B24B 7/30 (2006.01); B24B 7/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention is directed to a chemical-mechanical polishing composition comprising (a) an abrasive consisting essentially of aggregated silica, (b) an acid, and (c) a liquid carrier, wherein the polishing composition has a pH of about 5 or less. The invention is also directed to a method of polishing a substrate comprising a dielectric layer using the polishing composition.


Find Patent Forward Citations

Carter, Phillip. (2010). Compositions and methods for dielectric cmp (U.S. Patent No. 7677956). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7677956

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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