Company Filing History:
Years Active: 2010
Title: The Innovative Contributions of Farhana Khan
Introduction
Farhana Khan is a notable inventor based in Naperville, IL (US). She has made significant contributions to the field of chemical-mechanical polishing, particularly in the development of compositions and methods that enhance the efficiency of dielectric layer polishing.
Latest Patents
Farhana holds 1 patent for her invention titled "Compositions and methods for dielectric CMP." This invention is directed to a chemical-mechanical polishing composition that includes an abrasive made of aggregated silica, an acid, and a liquid carrier. The polishing composition is designed to have a pH of about 5 or less, which is crucial for effective substrate polishing.
Career Highlights
Farhana Khan is currently employed at Cabot Microelectronics Corporation, where she applies her expertise in materials science and engineering. Her work focuses on developing innovative solutions that improve the performance of semiconductor manufacturing processes.
Collaborations
Throughout her career, Farhana has collaborated with esteemed colleagues such as Phillip W. Carter and Gregory H. Bogush. These collaborations have fostered a productive environment for innovation and have contributed to advancements in the field.
Conclusion
Farhana Khan's contributions to the field of chemical-mechanical polishing exemplify her dedication to innovation and excellence. Her work continues to impact the semiconductor industry positively.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.