This inventor holds 3 USPTO granted patents. Top assignees: Kla Tencor Corporation, Onto Innovation Inc.. Active years: 2016-2020.
Company Filing History:
Years Active: 2016-2020
Title: Graham Michael Lynch: Innovator in Surface Measurement Technologies
Introduction
Graham Michael Lynch is a notable inventor based in Singapore, SG. He has made significant contributions to the field of surface measurement technologies, holding a total of 3 patents. His work focuses on innovative methods for determining surface topography and detecting defects in various materials.
Latest Patents
One of his latest patents involves the "Surface height determination of transparent film." This invention measures the surface topography of a sample with a transparent surface layer by comparing it to a reference sample. The process includes measuring the surface topographies of the reference sample before and after the deposition of an opaque film. By determining height differences at corresponding positions, the actual surface topography of the sample can be characterized, which is essential for detecting defects.
Another significant patent is related to "Detecting defects on a wafer." This method identifies locations of weak geometries in a wafer design, which are more prone to defects. By scanning the wafer with an inspection system, the method generates output that helps in detecting defects in instances of weak geometry across the wafer.
Career Highlights
Graham has worked with prominent companies in the industry, including Kla Tencor Corporation and Onto Innovation Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in surface measurement technologies.
Collaborations
Throughout his career, Graham has collaborated with notable professionals such as Eugene Shifrin and Ashok V Kulkarni. These collaborations have further enriched his work and expanded the impact of his inventions.
Conclusion
Graham Michael Lynch is a distinguished inventor whose work in surface measurement technologies has led to innovative solutions for detecting defects and characterizing materials. His contributions continue to influence the field and inspire future advancements.