Company Filing History:
Years Active: 2007-2013
Title: Innovations of Glen Wilk in Atomic Layer Deposition
Introduction
Glen Wilk is a prominent inventor based in Scottsdale, AZ, known for his significant contributions to the field of atomic layer deposition (ALD). With a total of nine patents to his name, Wilk has made remarkable advancements in the methods for forming metal silicate films and non-conformal layers.
Latest Patents
Wilk's latest patents include innovative methods for forming metal silicate films. These methods involve contacting a substrate with alternating and sequential vapor phase pulses of a silicon source chemical, metal source chemical, and an oxidizing agent. This process allows for the formation of silicon-rich hafnium silicate and zirconium silicate films with uniform coverage on substrate surfaces. Another notable patent focuses on the formation of non-conformal layers through variations of plasma enhanced atomic layer deposition. This technique allows for controlled deposition close to the substrate surface, optimizing the process for deep DRAM trenches and other intricate structures.
Career Highlights
Glen Wilk has built a successful career at Asm America, Inc., where he has been instrumental in developing cutting-edge technologies in the semiconductor industry. His expertise in atomic layer deposition has positioned him as a key figure in advancing manufacturing processes for electronic components.
Collaborations
Throughout his career, Wilk has collaborated with notable colleagues such as Steven Marcus and Chang-Gong Wang. These partnerships have fostered innovation and contributed to the success of various projects within the field.
Conclusion
Glen Wilk's contributions to atomic layer deposition and his innovative patents have significantly impacted the semiconductor industry. His work continues to pave the way for advancements in technology and manufacturing processes.
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