The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
Jul. 21, 2006
Chang-gong Wang, Chandler, AZ (US);
Eric J. Shero, Phoenix, AZ (US);
Glen Wilk, Scottsdale, AZ (US);
Jan Willem Maes, Wilrijk, BE;
Chang-gong Wang, Chandler, AZ (US);
Eric J. Shero, Phoenix, AZ (US);
Glen Wilk, Scottsdale, AZ (US);
Jan Willem Maes, Wilrijk, BE;
ASM America Inc., Phoenix, AZ (US);
Abstract
Methods for forming metal silicate films are provided. The methods comprise contacting a substrate with alternating and sequential vapor phase pulses of a metal source chemical, a silicon source chemical and an oxidizing agent. In preferred embodiments, an alkyl amide metal compound and a silicon halide compound are used. Methods according to preferred embodiments can be used to form hafnium silicate and zirconium silicate films with substantially uniform film coverages on substrate surfaces comprising high aspect ratio features (e.g., vias and/or trenches).