Kfar-Saba, Israel

Gilad Shomrony

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials South East Asia Pte. Ltd.. Active years: 2011.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Gilad Shomrony: Innovator in Optical Inspection Technology

Introduction

Gilad Shomrony is a notable inventor based in Kfar-Saba, Israel. He has made significant contributions to the field of optical inspection, particularly in the area of semiconductor wafers. His innovative approach to inspection technology has garnered attention in the industry.

Latest Patents

Gilad Shomrony holds a patent for "Optical inspection including partial scanning of wafers." This patent addresses the inspection of objects, such as semiconductor wafers, using a diluted scan method. The technique allows for selective imaging of areas, enabling a more efficient inspection process. By devising a dilution plan based on specific parameters, such as the size of the unit area and the distribution features of the wafer, Shomrony's method enhances the accuracy of defect density and distribution assessments.

Career Highlights

Shomrony is currently employed at Applied Materials South East Asia Pte. Ltd., where he continues to develop and refine his innovative inspection technologies. His work has positioned him as a key player in the semiconductor industry, contributing to advancements that improve manufacturing processes.

Collaborations

Throughout his career, Gilad has collaborated with notable colleagues, including Shai Silberstein and Arnon Gratch. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in optical inspection.

Conclusion

Gilad Shomrony is a distinguished inventor whose work in optical inspection technology has made a significant impact on the semiconductor industry. His innovative patent and ongoing contributions continue to shape the future of inspection methodologies.

Profile summary based on public USPTO records.
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