Gi-Vin Im

Title: Gi-Vin Im: Innovator in Semiconductor Technology

Introduction

Gi-Vin Im is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods of forming dielectric materials and oxide layers using atomic layer deposition (ALD). With a total of three patents to his name, Im's work has the potential to enhance the performance and efficiency of semiconductor devices.

Latest Patents

Gi-Vin Im's latest patents include methods that focus on the formation of dielectric materials and oxide layers. One of his patents, titled "Method of forming material using atomic layer deposition and method of forming capacitor of semiconductor device using the same," discloses techniques for creating dielectric materials that exhibit excellent step coverage and improved leakage current characteristics. This process utilizes a first reactant containing alkoxide groups, which is chemisorbed onto a substrate surface and then reacted with an activated oxidant.

Another notable patent is "Method of forming oxide layer using atomic layer deposition method and method of forming capacitor of semiconductor device using the same." This method introduces a precursor with an amino functional group onto a substrate, allowing for the formation of an oxide layer through a chemical reaction with an oxidant. The result is a thin oxide film with good deposition characteristics and reduced pattern loading rates.

Career Highlights

Gi-Vin Im is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology.

Collaborations

Some of Gi-Vin Im's notable coworkers include In-Sung Park and Jae-Hyun Yeo. Their collaboration in research and development has further propelled the innovations in semiconductor processes and materials.

Conclusion

Gi-Vin Im's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a key innovator in the field. His methods for forming dielectric materials and oxide layers using atomic layer deposition are paving the way for improved semiconductor devices.