Location History:
- Gyeonggi-do, KR (2012)
- Hwaseong-si, KR (2016)
Company Filing History:
Years Active: 2012-2016
Title: Gi-Sik Hong: Innovator in CMP Slurry Composition
Introduction
Gi-Sik Hong is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor device manufacturing through his innovative work on chemical mechanical polishing (CMP) slurry compositions. With a total of 2 patents to his name, his inventions are paving the way for advancements in the industry.
Latest Patents
Gi-Sik Hong's latest patents include a CMP slurry composition for polishing an organic layer and a method of forming a semiconductor device using the same. The CMP slurry composition is designed to include from 0.001% to 5% by weight of oxide-polishing particles, from 0.1% to 5% by weight of an oxidant, and various other components that enhance its effectiveness. This innovative slurry allows for the polishing of a silicon-free organic layer with a selectivity higher than 6:1 compared to an oxide layer. Additionally, he has developed a slurry composition that includes an abrasive and surfactants, which can be used for speedily polishing a stepped upper portion of a silicon oxide layer.
Career Highlights
Gi-Sik Hong is currently employed at Samsung Electronics Co., Ltd., where he continues to contribute to the development of advanced semiconductor technologies. His work is instrumental in improving the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Some of his notable coworkers include Yun-Jeong Kim and Sang-Kyun Kim, who collaborate with him on various projects within the semiconductor field.
Conclusion
Gi-Sik Hong's innovative contributions to CMP slurry compositions are vital for the advancement of semiconductor technology. His patents reflect a commitment to enhancing manufacturing processes and improving product quality in the industry.