Poway, CA, United States of America

German E Rylov

USPTO Granted Patents = 9 

 

Average Co-Inventor Count = 6.5

ph-index = 6

Forward Citations = 99(Granted Patents)


Location History:

  • Murrieta, CA (US) (2004 - 2007)
  • Poway, CA (US) (2006 - 2012)

Company Filing History:


Years Active: 2004-2012

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9 patents (USPTO):Explore Patents

Title: **The Innovative Contributions of German E. Rylov**

Introduction

German E. Rylov, a prominent inventor based in Poway, California, has made significant strides in the field of optical technology. With a portfolio of 9 patents, Rylov is recognized for his inventive spirit and contributions that cater to advanced laser systems and lithography apparatuses. His work is instrumental in shaping the future of optical engineering and precision instrumentation.

Latest Patents

Among his notable inventions, Rylov has introduced a groundbreaking **line narrowing module**. This apparatus is designed to refine laser light by implementing a grating that receives light and two movable prisms to adjust the angle of incidence. This innovation is particularly applicable as a line narrowing module for laser light sources, enhancing their performance and precision.

Moreover, Rylov has developed an **active bandwidth control for lasers**. In this invention, he combines a pulsed laser source with a mask designed using optical proximity correction (OPC). The active bandwidth control system dynamically adjusts the bandwidth of laser pulses based on real-time measurements, ensuring optimal performance. This innovative approach includes optics that modify the wavefront of the laser beam, increasing the efficiency and reliability of laser outputs.

Career Highlights

Rylov’s career is adorned with numerous achievements, primarily associated with Cymer, Inc., a leader in advanced light sources for lithography. His role has been pivotal in driving innovation and enhancing the capabilities of laser applications in the semiconductor industry. His expertise has enabled the development of solutions that significantly improve manufacturing processes and outcomes in high-technology sectors.

Collaborations

Throughout his career, Rylov has collaborated with esteemed colleagues, including Richard L. Sandstrom and William N. Partlo. These collaborations have fostered an environment of innovation, enabling the sharing of ideas and the advancement of technology within the field. Together, they have contributed to a legacy of excellence at Cymer, where teamwork and inventive thinking propel advancement.

Conclusion

German E. Rylov exemplifies the spirit of innovation in optical engineering. With his significant contributions, particularly in laser technology and lithography, he continues to influence the industry. As he advances his research and development efforts, Rylov’s work remains essential in the evolution of optical solutions, ensuring that the future of technology remains bright and ever-changing.

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