This inventor holds 2 USPTO granted patents. Top assignees: E/g Electro-Graph, Inc., Plansee USA LLC. Active years: 2023-2025.
Company Filing History:
Years Active: 2023-2025
Title: Gerhard Duerrhammer: Innovator in Ion Implantation Technology
Introduction
Gerhard Duerrhammer is a notable inventor based in Vista, California. He has made significant contributions to the field of ion implantation technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and functionality of ion implanters, which are crucial in semiconductor manufacturing.
Latest Patents
Duerrhammer's latest patents include a "Repeller assembly for mounting into an arc chamber of an ion implanter and arc chamber containing the repeller assembly." This invention features a repeller assembly that mounts within the arc chamber of an ion implanter, consisting of various components such as a repeller, tubular insert, and insulators. The design aims to improve the performance of ion implanters by optimizing the arrangement of these components. Another patent is the "Cathode holding assembly and arc chamber support assembly with the cathode holding assembly." This invention includes a cathode holding plate, insulator block, and shield cap, designed to ensure precise fitting and effective operation within the ion implanter.
Career Highlights
Throughout his career, Duerrhammer has worked with several companies, including Plansee USA LLC and E/G Electro-Graph, Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas in ion implantation technology.
Collaborations
Some of his notable coworkers include Nam Ngo and Jacob Boyer. Their collaboration has contributed to the advancement of technology in the field.
Conclusion
Gerhard Duerrhammer's contributions to ion implantation technology through his patents and career experiences highlight his role as an influential inventor. His work continues to impact the semiconductor industry positively.