Gerard Luk-Pat

Title: Innovations by Gerard Luk-Pat in Semiconductor Lithography

Introduction

Gerard Luk-Pat is a notable inventor based in Sunnyvale, CA, who has made significant contributions to the field of semiconductor lithography. With a total of 4 patents to his name, his work focuses on enhancing the efficiency and accuracy of lithographic processes used in semiconductor manufacturing.

Latest Patents

One of Gerard's latest patents is titled "Detection and removal of self-aligned double patterning artifacts." This invention discloses mask design techniques aimed at detecting and eliminating undesirable artifacts that arise during the lithographic and chemical processing of semiconducting wafers. These artifacts, known as spurs, can lead to unwanted connections or act as electrical antennas. Gerard's method employs rule-based techniques to detect these spurs and reduce their impact by modifying lithographic masks. The severity of the detected spurs is assessed using similar rule-based techniques, and the effects can be mitigated by adjusting the decomposition of drawn patterns into the two masks utilized for lithography.

Another significant patent is the "Method and system for performing lithography verification for a double-patterning process." This invention provides a system that conducts lithography verification on a mask layout without the need for a full contour simulation. The system operates by receiving a first and second mask used in the double-patterning process, which are derived from partitioning the mask layout. It evaluates specific points on the mask layout to determine their location relative to the masks and computes a printing indicator based on this analysis.

Career Highlights

Gerard Luk-Pat is currently employed at Synopsys, Inc., a leading company in electronic design automation. His work at Synopsys has allowed him to apply his innovative ideas to real-world challenges in semiconductor manufacturing.

Collaborations

Throughout his career, Gerard has collaborated with notable colleagues, including James Patrick Shiely and Hua Song. These collaborations have contributed to the advancement of technologies in the semiconductor industry.

Conclusion

Gerard Luk-Pat's contributions to semiconductor lithography through his innovative patents demonstrate his expertise and commitment to improving manufacturing processes. His work continues to influence the field and pave the way for future advancements in technology.