The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2009
Filed:
Aug. 13, 2004
Gerard Terrence Luk-pat, Sunnyvale, CA (US);
Fang-cheng Chang, Los Altos, CA (US);
Gerard Terrence Luk-Pat, Sunnyvale, CA (US);
Fang-Cheng Chang, Los Altos, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
The invention comprises processes for determining and applying a deblurring filter that reduces inspection system distortion, of mask inspection images, by compensating for the non-uniform frequency response of the inspection system. In particular, an adaptive filter is determined empirically for an inspection system: one or more training images are obtained by the inspection system and the filter is determined from such images. In this way, the filter can adapt to the characteristics of each individual inspection system. An example adaptive filter, known as a Weiner filter, is determined and applied.