Austin, TX, United States of America

George Walter Lange

This inventor holds 1 USPTO granted patent. Top assignee: Nxp USA, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: George Walter Lange. Retrieved from https://idiyas.com/inventor/george-walter-lange

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: George Walter Lange: Innovator in Semiconductor Technology

Introduction

George Walter Lange is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of latch-up detection and mitigation.

Latest Patents

Lange holds a patent for a "System having single-event latch-up detection and mitigation." This innovative method involves measuring the current of a first circuit block of a semiconductor device. When the measured current exceeds a first threshold, the supply voltage of the first circuit block is reduced from a nominal voltage value to a predetermined voltage value. After this reduction, the supply voltage is restored to its nominal value, effectively mitigating potential latch-up events.

Career Highlights

George Walter Lange is currently employed at NXP USA, Inc., where he continues to develop cutting-edge technologies in the semiconductor industry. His work has been instrumental in enhancing the reliability and performance of semiconductor devices.

Collaborations

Lange has collaborated with Gary Edwin Anderson, II, who is also a key figure in the field. Their combined expertise has contributed to advancements in semiconductor technology.

Conclusion

George Walter Lange's innovative work in semiconductor technology, particularly his patent on latch-up detection and mitigation, showcases his commitment to improving device reliability. His contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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