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For the Inventor, By the Inventor

Welches, OR, United States of America

George Edward Bailey

USPTO Granted Patents = 13

Average Co-Inventor Count = 2.3

ph-index = 4

Forward Citations = 46(Granted Patents)


Company Filing History:

goldMedal12 out of 3,715 
 
Lsi Logic Corporation
 patents
silverMedal1 out of 2,353 
 
Lsi Corporation
 patents

Years Active: 2003-2008

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13 patents (USPTO):Explore Patents
1. 7381502 - Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle (2008-06-03),
2. 7298458 - Optical error minimization in a semiconductor manufacturing apparatus (2007-11-20),
3. 7098996 - Optical error minimization in a semiconductor manufacturing apparatus (2006-08-29),
4. 7023530 - Dual source lithography for direct write application (2006-04-04),
5. 7005217 - Chromeless phase shift mask (2006-02-28),
6. 6943055 - Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer (2005-09-13),
7. 6934929 - Method for improving OPC modeling (2005-08-23),
8. 6894762 - Dual source lithography for direct write application (2005-05-17),
9. 6885436 - Optical error minimization in a semiconductor manufacturing apparatus (2005-04-26),
10. 6866970 - Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle (2005-03-15),
11. 6782525 - Wafer process critical dimension, alignment, and registration analysis simulation tool (2004-08-24),
12. 6764749 - Method to improve the resolution of a photolithography system by use of a coupling layer between the photo resist and the ARC (2004-07-20),
13. 6627466 - Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer (2003-09-30),

Title: George Edward Bailey: Innovator in Photolithography Systems

Introduction

George Edward Bailey is a notable inventor based in Welches, Oregon, with a remarkable portfolio of 13 patents. His work primarily focuses on enhancing photolithography systems, which are crucial in semiconductor manufacturing.

Latest Patents

Among his latest patents, Bailey has developed an "Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle." This innovative mask is designed for use in photolithographic processes, featuring a substrate with images on both surfaces that optimize energy reflection. Another significant patent is "Optical error minimization in a semiconductor manufacturing apparatus," which provides systems and methods to address optical errors caused by reticle usage. This invention allows for larger reticles while maintaining optical accuracy, thereby improving the overall efficiency of semiconductor fabrication.

Career Highlights

Throughout his career, Bailey has contributed to leading companies in the technology sector, including LSI Logic Corporation and LSI Corporation. His expertise in photolithography has made him a valuable asset in the semiconductor industry.

Collaborations

Bailey has worked alongside notable colleagues such as Michael J. Berman and Neal Patrick Callan, further enhancing his contributions to the field.

Conclusion

George Edward Bailey's innovative work in photolithography systems has significantly impacted semiconductor manufacturing. His patents reflect a commitment to improving technology and efficiency in the industry.

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