The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2004
Filed:
Jul. 29, 2002
Applicant:
Inventors:
Michael J. Berman, West Linn, OR (US);
George E. Bailey, Welches, OR (US);
Assignee:
LSI Logic Corporation, Milpitas, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
B32B 7/00 ; G03C 1/815 ; G03C 1/825 ;
U.S. Cl.
CPC ...
B32B 7/00 ; G03C 1/815 ; G03C 1/825 ;
Abstract
A method to improve the resolution of a photolithography system by using one or more coupling layers between a photo resist and an anti-reflective coating. The coupling layer(s) compensate for a mis-match in indexes of reflection between the photo resist and anti-reflective coating and minimize the amount of energy which is reflected back into the photo resist, thereby improving the quality of the resulting image which is formed on the photo resist during the process.