Location History:
- Woodside, NY (US) (1976)
- Gainesville, FL (US) (1999)
- Lake Jackson, TX (US) (2014 - 2016)
- Newark, DE (US) (2016 - 2023)
Company Filing History:
27 out of 308 
20 out of 4,629 
1 out of 23 Years Active: 1976-2023
Title: Innovations of George C. Jacob: Pioneering Advances in CMP Polishing Technology
Introduction: George C. Jacob, an accomplished inventor based in Newark, Delaware, has made significant contributions to the field of chemical mechanical polishing (CMP) technology. With a remarkable portfolio of 35 patents, Jacob is recognized for his inventive prowess, particularly in developing materials and methods that enhance the efficiency and effectiveness of polishing substrates in various industries.
Latest Patents: Among Jacob's latest patents is the innovative "Low-debris fluopolymer composite CMP polishing pad." This invention introduces a polymer-polymer composite polishing pad designed for polishing semiconductor, optical, and magnetic substrates. The unique design features a polishing layer with a surface specifically engineered to reduce debris particles generated during the polishing process. The polishing pad consists of a polymeric matrix containing gas-filled or liquid-filled microelements, along with fluoropolymer particles strategically embedded to maintain tensile strength while minimizing debris production.
Another significant development by Jacob involves methods of creating CMP polishing layers with enhanced uniformity. This patent outlines a manufacturing process that includes a composition of liquid-filled microelements encased in a polymeric shell. By employing centrifugal air classification, the method effectively separates fines and coarse particles, resulting in microelements that have a density suitable for creating superior CMP polishing layers.
Career Highlights: Jacob's extensive career includes pivotal roles at prominent companies such as Rohm and Haas, Electronic Materials CMP Holdings, Inc., and Dow Global Technologies LLC. His work at these organizations has been instrumental in advancing CMP technology and its applications in various industrial settings.
Collaborations: Throughout his career, Jacob has had the opportunity to collaborate with esteemed colleagues, including Bainian Qian and Marty W. DeGroot. These partnerships have fostered an environment of innovation, where ideas can be freely exchanged and transformed into tangible advancements in the field.
Conclusion: George C. Jacob's inventive legacy is characterized by his dedication to improving CMP technologies through innovative patents. His contributions are not only shaping the future of substrate polishing but also setting a benchmark for quality and efficiency in the industry. As he continues to push the boundaries of innovation, Jacob remains a leading figure in the realm of advanced materials and processes.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.