Company Filing History:
Years Active: 1995-2010
Title: Gean Hsu: Innovator in Plasma Processing Systems
Introduction
Gean Hsu is a notable inventor based in Fremont, CA, who has made significant contributions to the field of plasma processing systems. With a total of 4 patents to his name, Hsu has developed innovative methods and systems that enhance the functionality and efficiency of plasma processing technologies.
Latest Patents
Hsu's latest patents include groundbreaking work on plasma processing system component analysis software. This method involves defining component specifications for various components that perform user-interface functions, logic operations, input, and output functions for analyzing plasma processing systems. The process utilizes a visual integrated design editor architecture (VIDEA) to select and arrange components, ensuring that they are saved in a mark-up language executable by a browser without prior compiling. Another significant patent focuses on automated test and characterization data analysis methods. This method provides a comprehensive testing framework for components in plasma processing systems, utilizing an Automated Test and Characterization (ATAC) fixture that integrates system control software, data management, and testing modules.
Career Highlights
Throughout his career, Gean Hsu has worked with prominent companies in the semiconductor industry, including Lam Research Corporation and Applied Materials, Inc. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies and contribute to advancements in the field.
Collaborations
Hsu has collaborated with talented professionals, including Tina Pai-Lin Ku and Paul Ballintine, who have contributed to his projects and innovations. Their teamwork has played a crucial role in the development of Hsu's patents and the advancement of plasma processing systems.
Conclusion
Gean Hsu's innovative work in plasma processing systems showcases his dedication to advancing technology in this critical field. His patents reflect a commitment to improving the efficiency and effectiveness of plasma processing, making him a significant figure in the industry.