Gauri Nabar

Title: Gauri Nabar: Innovator in Metal Patterning Technology

Introduction

Gauri Nabar is a prominent inventor based in Hillsboro, Oregon, known for her contributions to the field of integrated circuit (IC) devices. She has made significant strides in the area of subtractive metal patterning, which is crucial for the development of advanced electronic components.

Latest Patents

Gauri Nabar holds a patent titled "Directed self-assembly enabled subtractive metal patterning." This patent describes innovative processes for forming tightly pitched patterned metal layers, such as metal gratings, in IC devices. The processes involve etching portions of a metal layer and replacing them with an insulator to create the desired metal grating. Notably, masks for etching are generated using directed self-assembly (DSA), allowing for multiple etching steps to achieve intricate designs.

Career Highlights

Gauri Nabar is currently employed at Intel Corporation, where she applies her expertise in metal patterning technologies. Her work has contributed to the advancement of IC devices, enhancing their performance and efficiency. With one patent to her name, she continues to push the boundaries of innovation in her field.

Collaborations

Gauri collaborates with esteemed colleagues, including Gurpreet Singh and Richard E. Schenker, who share her commitment to advancing technology in the semiconductor industry.

Conclusion

Gauri Nabar's innovative work in directed self-assembly and subtractive metal patterning positions her as a key figure in the development of next-generation IC devices. Her contributions are paving the way for future advancements in electronics.