Hefei, China

Gang Wang

This inventor holds 4 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignees: Anhui University, Hefei Visionox Technology Co., Ltd., Hefei Visionox Technology Co., Ltd.. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gang Wang. Retrieved from https://idiyas.com/inventor/gang-wang-5ut3r6fu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 75.0

 

Average Co-Inventor Count = 9.5

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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4 patents (USPTO):Explore Patents

Title: Gang Wang: Innovator in Photosensitive Circuit Structures and EBG Technology

Introduction

Gang Wang is a prominent inventor based in Hefei, China. He has made significant contributions to the field of electronics, particularly in the development of photosensitive circuit structures and electromagnetic band gap (EBG) technologies. With a total of 4 patents to his name, Wang continues to push the boundaries of innovation in his field.

Latest Patents

Wang's latest patents include a photosensitive circuit structure and an optical device. This invention features a photosensitive unit that comprises a photodiode and a reset transistor, along with a signal amplification unit and a control unit. The design allows for efficient signal processing and control, enhancing the performance of optical devices.

Another notable patent is the ultra-wideband electromagnetic band gap (EBG) structure and circuit board. This invention consists of multiple EBG units arranged in an array, each containing a power plane, dielectric substrate, and ground plane. The innovative design incorporates a coupled complementary split ring resonator (C-CSRR) and semi-improved Z-bridge structures, which contribute to the overall functionality and efficiency of the circuit board.

Career Highlights

Gang Wang has worked with esteemed institutions such as Anhui University and Hefei Visionox Technology Co., Ltd. His experience in these organizations has allowed him to collaborate with other experts in the field and further develop his innovative ideas.

Collaborations

Wang has collaborated with notable colleagues, including Xingang Ren and Zhixiang Huang. These partnerships have played a crucial role in advancing his research and patent developments.

Conclusion

Gang Wang is a distinguished inventor whose work in photosensitive circuit structures and EBG technology has made a significant impact in the field of electronics. His innovative patents and collaborations highlight his commitment to advancing technology and improving electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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