Kanagawa, Japan

Ganachev IvanPetrov

This inventor holds 1 USPTO granted patent. Top assignee: Shibaura Mechatronics Corporation. Active years: 2017.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Ganachev IvanPetrov: Innovator in Etching Technology

Introduction

Ganachev IvanPetrov is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of etching technology, particularly in the development of measurement apparatuses for dry etching processes. His innovative work has led to the filing of a patent that showcases his expertise and creativity.

Latest Patents

Ganachev holds a patent for an "Etching amount measurement apparatus for dry etching apparatus." This invention features an etching amount measurement pattern integrated into the surface of a substrate. The pattern consists of multiple components arranged in a two-dimensional layout that diffracts light incident on it. Notably, the configuration of these components exhibits 4-fold rotational symmetry, enhancing the precision of etching measurements.

Career Highlights

Ganachev IvanPetrov is currently employed at Shibaura Mechatronics Corporation, where he continues to push the boundaries of technology in the field of mechatronics. His work at the company has allowed him to collaborate with other talented professionals and contribute to innovative projects that advance the industry.

Collaborations

One of his notable coworkers is Munenori Iwami, with whom he has likely shared insights and expertise in their respective fields. Their collaboration may have fostered an environment of innovation and creativity within their projects.

Conclusion

Ganachev IvanPetrov's contributions to etching technology exemplify the spirit of innovation in the field. His patent and work at Shibaura Mechatronics Corporation highlight his commitment to advancing technology and improving measurement techniques in dry etching processes.

Profile summary based on public USPTO records.
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