The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2017
Filed:
Aug. 20, 2014
Applicant:
Shibaura Mechatronics Corporation, Yokohama-shi, Kanagawa-ken, JP;
Inventors:
Ganachev IvanPetrov, Kanagawa, JP;
Munenori Iwami, Kanagawa, JP;
Assignee:
SHIBAURA MECHATRONICS CORPORATION, Yokohama-Shi, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/06 (2006.01); G01N 21/84 (2006.01); H01L 21/66 (2006.01); H01J 37/32 (2006.01); C09K 13/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G01N 21/84 (2013.01); H01J 37/32963 (2013.01); H01J 37/32972 (2013.01); H01L 22/12 (2013.01); H01L 22/26 (2013.01); H01L 22/30 (2013.01); C09K 13/00 (2013.01); G01B 2210/56 (2013.01); H01L 21/67253 (2013.01);
Abstract
According to one embodiment, an etching amount measurement pattern is provided in a surface of a substrate. The pattern comprises a plurality of components two-dimensionally disposed and causing light incident on the pattern to be diffracted, A configuration of the component has 4-fold rotational symmetry. The plurality of components is arranged in a disposition having 4-fold rotational symmetry.