Company Filing History:
Years Active: 1997-2011
Title: Gad Neumann: Innovator in Wafer Defect Detection
Introduction
Gad Neumann is a prominent inventor based in Rehovot, Israel, known for his significant contributions to the field of wafer defect detection. With a total of 15 patents to his name, Neumann has developed innovative technologies that enhance the efficiency and accuracy of wafer inspection processes.
Latest Patents
One of Neumann's latest patents is a system for the fast on-line electro-optical detection of wafer defects. This system utilizes a short light pulse from a repetitively pulsed laser to illuminate a section of the wafer while it is in motion across the field of view of an imaging system. The imaging system captures the moving wafer and projects it onto a focal plane assembly, creating a continuous surface of photo-detectors. The laser pulse duration is significantly shorter than the pixel dwell time, effectively eliminating image smear during wafer motion. The system also features a novel fiber optical illumination delivery system that reduces the effects of source coherence. Additional innovations include methods for compensating for variations in the pulse energy of a Q-switched laser output, autofocusing techniques for the wafer imaging system, and Fourier plane filtering methods to remove repetitive image features, facilitating easier detection of wafer defects.
Career Highlights
Throughout his career, Gad Neumann has worked with notable companies such as Negevtech Ltd. and Applied Materials, Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in wafer inspection technologies.
Collaborations
Neumann has collaborated with esteemed colleagues, including Noam Dotan and Dov Furman, further enhancing his innovative work in the field.
Conclusion
Gad Neumann's contributions to wafer defect detection through his patented technologies demonstrate his expertise and commitment to innovation. His work continues to influence the industry and improve the processes involved in wafer inspection.
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