Fussa, Japan

Fumihiko Kato

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Shinkawa. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fumihiko Kato. Retrieved from https://idiyas.com/inventor/fumihiko-kato-tyl4eccw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 107(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Fumihiko Kato: Innovator in Electronic Circuit Technology

Introduction

Fumihiko Kato is a notable inventor based in Fussa, Japan. He has made significant contributions to the field of electronic circuit technology. His innovative methods have paved the way for advancements in the manufacturing of electronic components.

Latest Patents

Kato holds a patent for a method titled "Method for forming pin-form wires and the like." This patent describes a process for creating pin-form wires or bumps on electrode pads of electronic circuit elements. The method involves forming a ball at the tip of a wire that passes through a capillary, extending the wire, and using a cutter to create a notch. The ball is then bonded to the electrode pad, and the wire is cut at the notch to form the desired pin-form wire or bump.

Career Highlights

Fumihiko Kato is associated with Kabushiki Kaisha Shinkawa, a company known for its expertise in electronic manufacturing. His work has been instrumental in enhancing the efficiency and reliability of electronic components.

Collaborations

Kato has collaborated with notable colleagues such as Kazuo Sugiura and Hirofumi Moroe. Their combined efforts have contributed to the advancement of technology in their field.

Conclusion

Fumihiko Kato's innovative methods and patents have significantly impacted the electronic circuit industry. His contributions continue to influence the development of advanced electronic components.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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