Fujio Onishi

Title: Fujio Onishi: Innovator in Optical Measurement Technologies

Introduction

Fujio Onishi is a prominent inventor based in Tokyo, Japan, known for his contributions to optical measurement technologies. With a total of 5 patents, Onishi has made significant advancements in the field, particularly in automatic analyzers and light detection devices.

Latest Patents

Onishi's latest patents include an automatic analyzer and an optical measurement method designed to correct variations in the multiplication factor of photoelectric elements with high accuracy. The automatic analyzer features a photoelectric element that generates electrons through light and outputs a current signal. It also includes a voltage application unit that applies voltage to the photoelectric element and a processing unit that corrects variations in the multiplication factor based on the pulse area of the current signal.

Another notable patent involves a light amount detection device, immune analyzing apparatus, and charged particle beam apparatus that utilize the light amount detection device. This invention enhances the accuracy of light detection by calculating a time average value of signal components and performing base correction processing to discriminate dark current pulses from floor noises.

Career Highlights

Fujio Onishi has worked with notable companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His experience in these organizations has contributed to his expertise in developing innovative technologies in optical measurement.

Collaborations

Onishi has collaborated with esteemed colleagues, including Hidetsugu Tanoue and Hiroshi Touda, further enriching his work and contributions to the field.

Conclusion

Fujio Onishi's innovative work in optical measurement technologies has led to significant advancements in the industry. His patents reflect a commitment to enhancing accuracy and efficiency in various applications.