Hsinchu, Taiwan

Fu-Yao Nien

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2021-2025.

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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2 patents (USPTO):Explore Patents

Title: Fu-Yao Nien: Innovator in Semiconductor Technology

Introduction

Fu-Yao Nien is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods and structures that enhance the performance and efficiency of semiconductor devices.

Latest Patents

One of Fu-Yao Nien's latest patents involves a semiconductor device that includes a substrate, an isolation structure on the substrate, a fin protruding from the substrate and through the isolation structure, a gate stack engaging the fin, and a gate spacer on the sidewalls of the gate stack. The gate spacer features an inner sidewall facing the gate stack and an outer sidewall opposing the inner sidewall. The inner sidewall has a first height measured from the top surface of the fin and a bowed structure in the top portion of the inner sidewall. This bowed structure extends towards the gate stack for a first lateral distance measured from a middle point of the inner sidewall, which is less than about 8% of the first height. Another patent describes a method that includes providing a structure with a substrate and a fin protruding from the substrate, forming a dummy gate stack over the fin, and forming a gate spacer on the sidewalls of the dummy gate stack. The process involves removing the dummy gate stack using a radical etch process, resulting in a gate trench, and forming a metal gate stack in the gate trench.

Career Highlights

Fu-Yao Nien is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches have contributed to advancements in semiconductor manufacturing processes.

Collaborations

Fu-Yao has collaborated with notable colleagues, including Hong-Wei Huang and Wei-Yu Tsai, who share his commitment to advancing semiconductor technology.

Conclusion

Fu-Yao Nien's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to shape the future of semiconductor devices and manufacturing processes.

Profile summary based on public USPTO records.
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