Taichung, Taiwan

Fu-Quan Xu

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Siliconware Precision Industries, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fu-Quan Xu. Retrieved from https://idiyas.com/inventor/fu-quan-xu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Fu-Quan Xu: Innovator in Carrier Structures

Introduction: Fu-Quan Xu is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor packaging through his innovative designs. His work focuses on improving the precision and efficiency of chip placement operations.

Latest Patents: Fu-Quan Xu holds a patent for a carrier structure that enhances the alignment mechanism during chip placement. The patent describes a design where at least one positioning area is defined on a chip-placement area of a package substrate. Additionally, at least one alignment portion is disposed on the positioning area. This innovative approach improves the precision of manufacturing the alignment portion, leading to better outcomes in chip placement operations. He has 1 patent to his name.

Career Highlights: Fu-Quan Xu is currently employed at Siliconware Precision Industries, Ltd., a leading company in the semiconductor industry. His role involves developing advanced packaging solutions that cater to the evolving needs of technology.

Collaborations: Some of his notable coworkers include Cheng-Liang Hsu and Wan-Rou Chen, who contribute to the innovative environment at Siliconware Precision Industries.

Conclusion: Fu-Quan Xu's contributions to the field of semiconductor packaging through his innovative carrier structure patent demonstrate his commitment to advancing technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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