Fu-Kuo Tseng

Title: Fu-Kuo Tseng: Innovator in Semiconductor Technology

Introduction

Fu-Kuo Tseng is a notable inventor based in Junghe, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of process furnaces. His innovative approach has led to the development of a unique patent that enhances the efficiency of film deposition processes.

Latest Patents

Fu-Kuo Tseng holds a patent for a "Truncated dummy plate for process furnace." This invention is designed to promote substantially uniform flow of process gases across all regions on the surface of a substrate. This uniformity facilitates the deposition of a film with consistent thickness on the substrate. The truncated dummy plate features a circular shape with a flat edge on its curved side. Typically, during a Low-Pressure Chemical Vapor Deposition (LPCVD) process, at least two or preferably three or four of these dummy plates are strategically positioned on a wafer boat near a gas outlet in a process furnace. The flat edges of the dummy plates are oriented towards the gas inlet side, while the rounded edges face the gas outlet side of the process chamber.

Career Highlights

Fu-Kuo Tseng is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work has been instrumental in advancing the technology used in semiconductor manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Yen-Hsing Chen and Hsing-Jui Lee, contributing to various projects that enhance semiconductor technology.

Conclusion

Fu-Kuo Tseng's innovative contributions to semiconductor technology, particularly through his patented truncated dummy plate, demonstrate his commitment to advancing the field. His work continues to influence the efficiency of film deposition processes in the semiconductor industry.