Company Filing History:
Years Active: 2003-2013
Title: The Innovations of Fu-Chang Lo: A Pioneer in Lithography Systems
Introduction
Fu-Chang Lo, an accomplished inventor based in Palo Alto, California, has made significant contributions to the field of lithography systems. With a total of seven patents to his name, he continues to push the boundaries of technology and innovation. Working at Intel Corporation, Fu-Chang has demonstrated dedication to advancing the capabilities of modern semiconductor manufacturing.
Latest Patents
Among his notable inventions is a patent for "Mounting a Pellicle to a Frame." This innovation involves a pellicle membrane being mounted between an outer frame and an inner frame. Remarkably, at least one of these frames is attached to the reticle without the use of conventional adhesives. This design is particularly beneficial for lithography systems as the pellicle allows radiation to pass through to the reticle while effectively preventing particles from interfering with the process. This dual functionality is critical for enhancing the precision and efficiency of semiconductor fabrication.
Career Highlights
Fu-Chang Lo's work at Intel Corporation has been instrumental in the development of advanced lithography techniques. His inventions not only improve the performance of semiconductor manufacturing but also align with the industry's need for cleaner and more efficient processes. With each patent, he showcases his commitment to innovation and excellence in technology.
Collaborations
During his career, Fu-Chang has had the opportunity to collaborate with talented colleagues, including Florence Eschbach and Alexander Tregub. Their combined expertise has fostered an environment of creativity and innovation, leading to groundbreaking advancements in their field.
Conclusion
Fu-Chang Lo's contributions to the world of lithography and semiconductor technology are noteworthy. With multiple patents under his belt and a collaborative spirit, he continues to be a valuable asset to Intel Corporation and the broader technology landscape. As innovations in this field evolve, Fu-Chang's work will undoubtedly play a crucial role in shaping the future of semiconductor manufacturing.