The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Aug. 11, 2011
Applicants:
Florence Eschbach, Portola Valley, CA (US);
Paul Zimmerman, Cedar Creek, TX (US);
Alexander Tregub, Oak Park, CA (US);
Fu-chang Lo, Palo Alto, CA (US);
Inventors:
Florence Eschbach, Portola Valley, CA (US);
Paul Zimmerman, Cedar Creek, TX (US);
Alexander Tregub, Oak Park, CA (US);
Fu-Chang Lo, Palo Alto, CA (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.