Location History:
- San Jose, CA (US) (2002 - 2004)
- Cupertino, CA (US) (2008 - 2014)
Company Filing History:
Years Active: 2002-2014
Title: Innovations of Frederick Chen in Advanced Mask Patterning
Introduction
Frederick Chen, an accomplished inventor based in Cupertino, CA, has made significant contributions to the field of advanced imaging structures. With a remarkable portfolio of four patents, he is recognized for his innovations that enhance the capabilities of patterning technologies in semiconductor manufacturing.
Latest Patents
Among his latest inventions is the patent titled "Advanced mask patterning with patterning layer." This innovation involves the fabrication of an imaging structure, such as a mask or reticle, utilizing a patterning layer on an imaging layer. The unique aspect of this design is that the patterning layer exhibits substantially different etch properties compared to the imaging layer. The patented process includes a first etch process that is selective of the patterning layer relative to a resist layer, followed by a second etch process that is selective of the imaging layer concerning the patterning layer. This dual-process approach optimizes the accuracy and efficiency of manufacturing intricate designs in semiconductor devices.
Career Highlights
Frederick Chen is currently associated with Intel Corporation, a leader in technological innovations and semiconductor manufacturing. His role at Intel has positioned him to influence the development of cutting-edge technologies and processes that are crucial in the industry.
Collaborations
Throughout his career, Frederick has collaborated with several talented professionals, including his coworkers Wilman Tsai and Marilyn Kamna. These collaborations reflect a strong team ethos and commitment to pushing the boundaries of innovation within the semiconductor field.
Conclusion
Frederick Chen’s contributions through his patents not only highlight his inventiveness but also underline the importance of collaboration in achieving groundbreaking advancements. His work at Intel Corporation and other collaborations has paved the way for future developments in advanced mask patterning technologies, ensuring a brighter future for the semiconductor industry.