Company Filing History:
Years Active: 1985-1988
Title: Frank Kolondra: Innovator in Ion Implantation Technology
Introduction
Frank Kolondra is a notable inventor based in Delaware, NJ (US). He has made significant contributions to the field of ion implantation technology, holding a total of 3 patents. His work focuses on methods that enhance the efficiency and safety of ion-implanted devices.
Latest Patents
Kolondra's latest patents include a method for reducing electrostatic charge on ion-implanted devices. This method utilizes an apparatus for ion implantation that provides a flood of electrons to neutralize the charge on an ion-implanted wafer after implantation. This innovation prevents electrostatic sticking attraction between the wafer and the support mechanism. Another significant patent is for a method for preventing arcing in a device during ion implantation. This invention describes an ion implantation apparatus that allows for electron flooding during ion implantation, neutralizing the positive space-charge on an ion beam and ensuring that only harmless negative charges remain.
Career Highlights
Throughout his career, Kolondra has worked with prominent companies such as RCA Inc. and General Electric Company. His experience in these organizations has contributed to his expertise in the field of ion implantation technology.
Collaborations
One of his notable collaborators is Chung P Wu, with whom he has worked on various projects related to ion implantation.
Conclusion
Frank Kolondra's innovative work in ion implantation technology has led to significant advancements in the field. His patents reflect a commitment to improving device performance and safety.