Saint Martin d'Heres, France

Francois Bourg

This inventor holds 1 USPTO granted patent. Top assignee: Commissariat a L'energie Atomique Et Aux Energies Alternatives. Active years: 1987.


% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: The Innovations of Francois Bourg

Introduction

Francois Bourg is a notable inventor based in St. Martin d'Heres, France. He has made significant contributions to the field of ion sources, particularly with his innovative designs that have various applications in technology and research.

Latest Patents

Francois Bourg holds a patent for an Electron Cyclotron Resonance Ion Source. This invention features a plasma confined in a magnetic configuration, which includes a first group of coils located in the plane defined by the tight window of an ultra-high frequency injector. These coils supply the magnetic field necessary for creating and confining the plasma. Additionally, a second group of coils is supplied in a counter-field compared to the first group, surrounding an ion extraction system. The ion extraction occurs in a magnetic field well below that corresponding to the cyclotron resonance. This ion source has numerous applications in thin layer sputtering, microetching, ion implantation, and accelerators.

Career Highlights

Francois Bourg is associated with the Commissariat à l'Énergie Atomique, where he has been able to apply his expertise in developing advanced ion sources. His work has contributed to the advancement of technologies that rely on precise ion manipulation.

Collaborations

Francois has collaborated with notable colleagues such as Marc Delaunay and Rene Gualandris, enhancing the research and development efforts in their field.

Conclusion

Francois Bourg's contributions to the field of ion sources exemplify the impact of innovative thinking in technology. His patent for the Electron Cyclotron Resonance Ion Source showcases his ability to address complex challenges in ion manipulation.

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