The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 1987
Filed:
May. 18, 1984
Marc Delaunay, Grenoble, FR;
Rene Gualandris, Grenoble, FR;
Richard Geller, Grenoble, FR;
Claude Jacquot, St Egreve, FR;
Paul Ludwig, Grenoble, FR;
Jean-Marc Mathonnet, Grenoble, FR;
Jean-Claude Rocco, Claix, FR;
Pierre Sermet, Grenoble, FR;
Francois Zadworny, Corenc, FR;
Francois Bourg, St. Martin d'Heres, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
An electron cyclotron resonance ion source in which a plasma is confined in a magnetic configuration having a first group of coils located in the plane defined by the tight window of an ultra-high frequency injector and surrounding the latter, supplying the magnetic field creating and confining a plasma as well as a second group of coils supplied in counter-field compared with the first group and surrounding an ion extraction system. Ion extraction takes place in a magnetic field well below that corresponding to the cyclotron resonance. This ion source has numerous applications in the field of thin layer sputtering, microetching, ion implantation, accelerators, etc.