Franck Ernult

Title: Franck Ernult: Semiconductor and Sputtering Technology Inventor.

Introduction.

Franck Ernult is an inventor based in Chofu, Japan, whose patent work focuses on sputtering technology and semiconductor memory manufacturing. His listed portfolio includes 2 patents, including inventions concerning substrate motion during deposition and the formation of semiconductor memory elements.

Latest Patents.

One of Ernult’s patents, “Sputtering Apparatus, Sputter Deposition Method, and Analysis Apparatus,” describes equipment designed to deposit films on a substrate. Its substrate holder uses stages that spin and revolve around offset axes. The spinning motion runs opposite to the revolving motion and helps maintain the specified direction of an applied magnetic field.

Another patent, “Method for Manufacturing Semiconductor Memory Element and Sputtering Apparatus,” addresses adhesion between a chalcogenide material layer and an electrode layer. The method forms the electrode by sputtering in a mixture of reactive and inert gases, with the reactive-gas flow ratio selected within a hysteresis region associated with the cathode voltage.

Career Highlights.

Ernult’s listed inventions connect specialized sputtering apparatus with practical semiconductor fabrication processes. Together, they address control of deposition conditions and the formation of layered structures used in semiconductor memory elements.

Collaborations.

Ernult is associated with Canon Anelva Corporation. His listed coworkers include Tetsuro Ogata and Eisaku Watanabe.

Conclusion.

Franck Ernult’s patent portfolio reflects a focus on sputtering systems and semiconductor memory manufacturing, with inventions aimed at controlling deposition and improving layer adhesion.