Best, Netherlands

Franciscus Wilhelmus Bell

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Franciscus Wilhelmus Bell. Retrieved from https://idiyas.com/inventor/franciscus-wilhelmus-bell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 22.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Franciscus Wilhelmus Bell

Introduction: Franciscus Wilhelmus Bell, a talented inventor based in Best, Netherlands, has made significant contributions to the field of lithography with his groundbreaking patent.

Latest Patents: Bell's notable patent is for a Lithographic apparatus, a method of controlling the apparatus, and a device manufacturing method. This method involves adjusting the scanning and stepping speeds between the substrate table and the projection system during imaging of a target within a predefined area at or near the edge of the substrate. The innovative aspect lies in the ability to lower the speeds for more precise manufacturing processes.

Career Highlights: Franciscus Wilhelmus Bell is associated with the prestigious company ASML Netherlands B.V. ASML is a leader in lithography equipment manufacturing and is known for pushing the boundaries of technology in the semiconductor industry. Bell's work at ASML showcases his expertise and dedication to advancing lithographic processes.

Collaborations: Throughout his career, Bell has collaborated with esteemed professionals in the field, including his coworkers Marco Koert Stavenga and Nicolaas Rudolf Kemper. These collaborations have further enriched his knowledge and contributed to the success of his innovative projects.

Conclusion: Franciscus Wilhelmus Bell's inventive spirit and passion for lithography have solidified his position as a respected figure in the field. His dedication to pushing the boundaries of technology and collaborating with industry experts highlight his commitment to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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