The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Feb. 01, 2010
Marco Koert Stavenga, Eindhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Richard Moerman, Son, NL;
Michel Riepen, Veldhoven, NL;
Sergei Shulepov, Eindhoven, NL;
Gert-jan Gerardus Johannes Thomas Brands, Waalre, NL;
Koen Steffens, Veldhoven, NL;
Jan Willem Cromwijk, Best, NL;
Ralph Joseph Meijers, Kerkrade, NL;
Fabrizio Evangelista, Eindhoven, NL;
David Bessems, Eindhoven, NL;
Hua LI, Eindhoven, NL;
Marinus Jochemsen, Veldhoven, NL;
Pieter Lein Joseph Gunter, Weert, NL;
Franciscus Wilhelmus Bell, Best, NL;
Erik Witberg, Breda, NL;
Marcus Agnes Johannes Smits, Hamont-Achel, BE;
Zhenhua MA, Eindhoven, NL;
Marco Koert Stavenga, Eindhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Richard Moerman, Son, NL;
Michel Riepen, Veldhoven, NL;
Sergei Shulepov, Eindhoven, NL;
Gert-Jan Gerardus Johannes Thomas Brands, Waalre, NL;
Koen Steffens, Veldhoven, NL;
Jan Willem Cromwijk, Best, NL;
Ralph Joseph Meijers, Kerkrade, NL;
Fabrizio Evangelista, Eindhoven, NL;
David Bessems, Eindhoven, NL;
Hua Li, Eindhoven, NL;
Marinus Jochemsen, Veldhoven, NL;
Pieter Lein Joseph Gunter, Weert, NL;
Franciscus Wilhelmus Bell, Best, NL;
Erik Witberg, Breda, NL;
Marcus Agnes Johannes Smits, Hamont-Achel, BE;
Zhenhua Ma, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.