Taipei, Taiwan

Fon Yuan


Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 11(Granted Patents)


Location History:

  • Taipei, TW (2004)
  • Hsinchu, TW (2004)

Company Filing History:


Years Active: 2004

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2 patents (USPTO):Explore Patents

Title: Fon Yuan: Innovating Semiconductor Technologies in Taipei

Introduction

Fon Yuan is a distinguished inventor based in Taipei, Taiwan, known for his contributions to semiconductor technology. With two patent filings to his name, Yuan has significantly advanced the field through innovative methods and structures that enhance efficiency and reliability in electronic components.

Latest Patents

Yuan's latest patents demonstrate his expertise in improving metal-insulator-semiconductor reliability. One notable invention is a method that utilizes a rough insulator to enhance this reliability. The method entails several steps: providing a semiconductor substrate, prebaking it under a high vacuum to create a rough surface, and subsequently growing an insulator on the substrate. This innovative approach ensures increased reliability when the insulator is applied.

In addition, Yuan has developed a semiconductor phototransistor that boasts a unique structure. This phototransistor features a sidewall grown on the collector side and underneath the base. The sidewall is equipped with a contact that, when connected to an external voltage, allows for the rapid removal of holes accumulated at the junction of the base and emitter. This invention tackles a common issue in prior art, where the use of bias between the base and emitter often leads to high dark current, power consumption, and reduced optoelectronic conversion gain.

Career Highlights

Fon Yuan has had a noteworthy career, contributing to prestigious institutions such as the Industrial Technology Research Institute and National Taiwan University. His experiences at these organizations have enabled him to leverage academic knowledge and practical applications in his inventions.

Collaborations

During his career, Yuan has collaborated with esteemed colleagues such as Chee-Wee Liu and Yu-Min Hsu. These partnerships have enriched his research and development process and fostered innovative thinking in semiconductor applications.

Conclusion

With his innovative spirit and dedication, Fon Yuan continues to make significant strides in the field of semiconductor technology. His patents not only enhance the reliability of electronic components but also pave the way for future advancements in the industry. As he forges ahead, the impact of his work is anticipated to resonate throughout the technological landscape.

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