Feng Zhao

Title: The Innovations of Feng Zhao

Introduction

Feng Zhao is a prominent inventor based in Singapore, known for his contributions to the field of semiconductor technology. With a total of 2 patents, he has made significant advancements in integrated circuit systems and polishing methods used in semiconductor device fabrication.

Latest Patents

Feng Zhao's latest patents include an "Integrated circuit system with via and method of manufacture thereof." This patent describes a method for manufacturing an integrated circuit system that involves forming an etch stop layer over a bulk substrate, followed by the creation of a buffer layer and a hard mask. The process includes forming a through silicon via and a passivation layer, ensuring the integrity and functionality of the integrated circuit.

Another notable patent is the "Polishing method with inert gas injection." This innovative polishing process utilizes a polishing composition that creates a gaseous phase within the composition. The dynamic response of the gaseous phase to changes in the surface profile during polishing helps to achieve a uniformly smooth and flat polished surface, independent of pattern density.

Career Highlights

Feng Zhao is currently employed at Globalfoundries Singapore Pte. Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Feng has collaborated with notable colleagues, including Wu Ping Liu and John Leonard Sudijono. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Feng Zhao's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a leading inventor. His innovative approaches continue to shape the future of integrated circuit systems and semiconductor fabrication processes.